The VP-C120 Vacuum Plasma Cleaning Equipment is a plasma-cleaning solution designed for surface cleaning and activation in precision manufacturing processes. It uses a controlled vacuum environment to support plasma treatment of components and materials before subsequent production steps.
The equipment is suitable for applications where controlled surface preparation is important, including cleaning, activation, and improving the suitability of surfaces for bonding or coating. Exact technical specifications and application details should be confirmed with VCAM before publication.
Specification | Details |
|---|---|
Product Name | Vacuum Plasma Cleaning Equipment — VP-C120 |
Category | Digital Manufacturing & Process Solutions → Dry Cleaning Solutions |
Product Overview | Vacuum plasma equipment for cleaning, activating, and modifying product surfaces in a controlled vacuum environment. |
Key Features | Efficient cleaning; surface activation; surface-energy improvement; multi-gas process support; cleaning of complex-shaped surfaces; PLC and touchscreen control; manual and automatic operation. |
Applications | Printing pretreatment, bonding pretreatment, spraying pretreatment, welding pretreatment, coating pretreatment, dispensing pretreatment. |
Key Benefits | Helps improve surface energy, wettability, and bonding properties; supports controlled process operation; reduces the need for chemical solvents; suitable for precision surface preparation. |
Available Types | VP-C120 vacuum plasma cleaning equipment. |
Performance Characteristics | Working vacuum 5–50 Pa; rated power ≤5 kW; single cleaning cycle ≤8 minutes, depending on the product; vacuum chamber options of 80 L and 120 L. |
Industries Served | Electronics Manufacturing, Semiconductor & Advanced Packaging, Automotive Electronics, Consumer Electronics, Medical Electronics, Aerospace & Defense. |
Handling & Maintenance | Requires suitable electrical, gas, vacuum, and environmental conditions. Regular inspection and maintenance should follow the manufacturer’s operating requirements. |
Customization Options | Chamber capacity, electrode structure, vacuum system, RF power, gas-control configuration, and production requirements can be customized or selected according to the published configuration. |
Parameter | VP-C120 |
|---|---|
Equipment Dimensions | W × D × H: 1030 × 1281 × 1632 mm |
Chamber Size | 430 × 434 × 653 mm — 120 L / 420 mm — 80 L |
Electrode Plate | 335 × 350 mm; 14 horizontal layers |
External Power Supply | AC-380V ±15%, 50 Hz, three-phase five-wire system |
Rated Power | ≤5 kW |
Control System | Siemens PLC + Weiluntong touchscreen |
Vacuum System | Roots vacuum pump + rotary vane vacuum pump |
Vacuum Gauge | INFICON Pirani vacuum gauge |
Gas Control | Mass flow controller, 0–200 ml/min (sccm) |
RF Power Supply | 1000 W / 500 W options |
Working Vacuum | 5–50 Pa |
Operation Method | Manual loading and unloading; one-button start/stop; recipe storage and recall |
Cleaning Capacity | Single cleaning cycle ≤8 minutes, depending on the product |
Site Requirements | Temperature ≤45°C; relative humidity 35–75% |
The technical values above are from VCAM’s published VP-C120 product page. The page also confirms its vacuum-plasma cleaning principle, surface-activation functions, and application scenarios.
